Two Indian-Americans Sumita Mitra and Arogyaswami Paulraj inducted into the prestigious US National Inventors Hall of Fame

National Inventors Hall of Fame

The National Inventors Hall of Fame honours people who are responsible for the greatest technological advances that make human, social and economic progress possible. It is indeed a proud moment for India as two Indian born Americans – Sumita Mitra and Arogyaswami Paulraj have been inducted into the US Patent Office’s National Inventors Hall of Fame.

Sumita Mitra, who is an alumnus of Presidency College, Kolkata, and Calcutta University, was honoured for inventing the first dental filling material to include nanoparticles and Arogyaswami Paulraj, professor emeritus at Stanford, has been recognized for his 1992 US patent on MIMO – Multiple In-Multiple Out – wireless technology.

Sumita Mitra, 69, was a chemist at 3M Oral Care, the dental products division of 3M, best known for its Post-it notes and Scotchgard fabric protector. Her inventions have led to a number of breakthroughs in dental technologies, including nanocomposites and dental adhesives. Mitra’s product line has been used in more than 600 million dental restorations worldwide.

Arogyaswami Paulraj was born in Pollachi, Tamil Nadu, India, in 1944. He joined the Indian Navy at the age of 15. Impressed with his academic record, the Navy sent him to IIT-Delhi, where he earned a PhD for advances to signal filtering theory. Paulraj served the Indian Navy for 25 years where he led the development of the APSOH sonar, one of India’s most successful military development projects. He also founded three national laboratories in the areas of high-speed computing, AI and robotics, and military electronics.

Arogyaswami Paulraj’ MIMO (Multiple In Multiple Out) wireless technology uses multiple antennas both at the transmitter and receiver in a wireless link to boost wireless data rates. The ubiquitous broadband wireless internet access we enjoy today and 5G in the near future would not be possible without MIMO technology.